Nanomagnetism & Oxides Laboratory
Pulsed Laser Deposition (PLD)
Growth of epitaxial layers by pulsed laser deposition (PLD) consists in ablating a target by high power laser pulse typically in the U.V. range. The intense electric field of the light triggers a plasma plume from the target which leads to the evaporation of the target materials onto the substrat surface. One advantage of PLD over MBE and/or sputtering approaches lies in its ability to trasnfer easily complex stochiometry from the target to the grown epitaxial layer. In our group, we use PLD to grow various high quality oxides among which ferromagnets (LaSrMnO3...), antiferromagnets (NiO, Cr2O3 ...) or more exotic such as irridates (Sr2IrO4...).
Courtesy T. Chirac
Technical characteristics :
  • U.H.V. (P<10-9 mbar)
  • Sample holder with laser-beam heater (Tmax = 1200 °C)
  • up to 5 possible targets
  • RHEED up to 10-1 mbar (differential pumping)
  • Reactive atmosphere (O/Ar/N)
  • ns pulsed 355 nm (triple YAG) light source